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Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) is a technique in which an ion beam (primary ion) is irradiated on a solid sample and mass separation of the ions emitted from the surface (secondary ions) is performed using the difference in time-of-flight (time-of-flight is proportional to the square root of the weight). TOF-SIMS can obtain information regarding elements or molecular species within 1 nm of the sample surface at a very high detection sensitivity.
Mass spectrum study for elemental and organic composition Elemental and organic species mapping Dopant and impurity depth profiling Elemental 3D reconstruction for profile study Composition and impurity measurements of thin films (metals, dielectrics, SiGe) High-precision matching of process tools such as ion implanters |
Nanodevices Polymer blends Pharmaceuticals Thin films/surface coatings corrosion Catalysis Geologic materials Glass industries |
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Mr. Nilesh Raghunath Marle CRNTS/SAIF IIT Bombay Contact : 022-2159 6872 Email Id : simslab@iitb.ac.in |
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